Advantages
①The closed-loop motion control system ensures the smooth motion of the conveying mechanism.
②The upper surface of the polishing tank is protected by a water film and the coarse thread is floated on water, which also protects the front and polishes the back.
③The drying tank is designed with high-pressure fan + high-efficiency filter, and the temperature control accuracy error in the tank is <±1°C.
④Alkali polishing equipment: Chain type PSG+trough type alkali polishing equipment, with large capacity and good stability.
Benefits
①Acid polishing 5-channel capacity ≥4500PCS/H
②Acid polishing 10-channel capacity ≥6500PCS/H
③Alkali polishing equipment capacity ≥8000PCS/H
④Fragmentation rate ≤0.01%
⑤Uptime≥98%
⑥Speed ≥2.5m/min
⑦Etching/polishing, cleaning, and drying single and polycrystalline silicon wafers.
Lead time
①90 days after advance payment
