Product Detail
Semiconductor silicon rod automatic grinding machine
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Semiconductor silicon rod automatic grinding machine

Type:Silicon (germanium) - based semiconductors
Development:Lianqiang Intelligent
Detailed introduction

Parameter attribute

Diameter of processing bar 150~220mm (6''-8'’)/200~320mm (8''-12'')

Length of processing bar: 100~600mm (6''-8'')/100~450mm (12'')

Grinding precision: Ovality≤0.05mm/L300mm

Conicity≤0.05mm/L300mm

Diameter accuracy0.05mm/L300mm

Flat surface roughness Ra≤2μmArc surface roughness Ra≤2μm

OF width: ±0.1mm

V NOTCH depth: 1.00~+0.25mm

Top R angle: R0.9~0.94mm (customizable)

V angle:89°~93° (customizable)

Crystal orientation accuracy: <±12′

Intake pressure: 5~7bar

Industrial water pressure: 0.25~0.35MPa

Dimension of equipment: 4900×2810×2350mm

Total power of equipment: 30kW

Equipment weight: 10.5t

Advantages

Silicon rod automatic centering and clamping

Automatic measurement of silicon rod outer diameter

The coarse and fine grinding of the outer circle is completed on the same equipment

Automatic detection of crystallographic orientation

Automatic calculation of positioning edge/Notch angle for precise machining

With cleaning and drying system, convenient for secondary detection

Lead time

90 days after advance payment of main equipment